Electron Collisions with Molecules, Clusters, and Surfaces (e-bog) af -
Morgan, L.A. (redaktør)

Electron Collisions with Molecules, Clusters, and Surfaces e-bog

875,33 DKK (inkl. moms 1094,16 DKK)
This volume contains the invited papers and selected contributed papers presented at the biennial International Symposium on ELECTRON COLLISIONS WITH MOLECULES, CLUSTERS AND SURF ACES held at Royal Holloway, University of London from 29th to 30th July, 1993. This Symposium was a Satellite Meeting of the XVIII International Conference on the Physics of Electronic and Atomic Collisions (ICPEAC) a...
E-bog 875,33 DKK
Forfattere Morgan, L.A. (redaktør)
Forlag Springer
Udgivet 29 juni 2013
Genrer Classical mechanics
Sprog English
Format pdf
Beskyttelse LCP
ISBN 9781489914897
This volume contains the invited papers and selected contributed papers presented at the biennial International Symposium on ELECTRON COLLISIONS WITH MOLECULES, CLUSTERS AND SURF ACES held at Royal Holloway, University of London from 29th to 30th July, 1993. This Symposium was a Satellite Meeting of the XVIII International Conference on the Physics of Electronic and Atomic Collisions (ICPEAC) and follows a 16 year tradition of Satellite Conferences in related areas of collisions held in association with previous ICPEAC's. In the past each of these electron -molecule symposia covered the broad field of electron-molecule scattering at rather low energies, but also included hot topics. This time as well as covering the whole field, well defined electron collisions with clusters and with particles in the complex potential of a surface were emphasized. Not many details are known about such collisions, although they become more and more important in surface characterisation, plasma-wall interactions, electron induced desorption and reorganisation of adsorbed particles. Recently, much work, theoretical and experimental, has been devoted to electron collisions with rather large carbon, silicon and halogen containing molecules. These problems are of relevance in plasma assisted thin film formation and etching of surfaces and can now be approached with advanced theoretical methods and experimental equipment.