Tribology In Chemical-Mechanical Planarization e-bog
546,47 DKK
(inkl. moms 683,09 DKK)
The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization (CMP) technology, particularly when applied to nanosurfaces. Tribology in Chemical-Mechanical Planarization presents a detailed account of the CMP process in a language that is
E-bog
546,47 DKK
Forlag
CRC Press
Udgivet
1 marts 2005
Længde
200 sider
Genrer
Technology: general issues
Sprog
English
Format
pdf
Beskyttelse
LCP
ISBN
9781420028393
The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization (CMP) technology, particularly when applied to nanosurfaces. Tribology in Chemical-Mechanical Planarization presents a detailed account of the CMP process in a language that is