Tribology In Chemical-Mechanical Planarization (e-bog) af Craven, David
Craven, David (forfatter)

Tribology In Chemical-Mechanical Planarization e-bog

546,47 DKK (inkl. moms 683,09 DKK)
The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization (CMP) technology, particularly when applied to nanosurfaces. Tribology in Chemical-Mechanical Planarization presents a detailed account of the CMP process in a language that is
E-bog 546,47 DKK
Forfattere Craven, David (forfatter)
Forlag CRC Press
Udgivet 1 marts 2005
Længde 200 sider
Genrer Technology: general issues
Sprog English
Format pdf
Beskyttelse LCP
ISBN 9781420028393
The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization (CMP) technology, particularly when applied to nanosurfaces. Tribology in Chemical-Mechanical Planarization presents a detailed account of the CMP process in a language that is