Theory and Application of Laser Chemical Vapor Deposition e-bog
1240,73 DKK
(inkl. moms 1550,91 DKK)
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to ap...
E-bog
1240,73 DKK
Forlag
Springer
Udgivet
29 juni 2013
Genrer
TGMM
Sprog
English
Format
pdf
Beskyttelse
LCP
ISBN
9781489914309
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.